News | D2S

Semiconductor Engineering: Luminary Panel Sees Progress In EUV Pellicle Adoption As Critical For EUV

News • November 21, 2024

Factors that impact mask lifetime, the future role of actinic inspection, and minimum mask dimensions for high-NA EUV.

Semiconductor Engineering: Luminary Panel Sees Multi-Beam Mask Writers And Curvilinear Masks Key To 193i And EUV

News • October 24, 2024

Purchases of new photomask equipment are expected to grow over the next three years.

Semiconductor Industry Luminary Bala Thumma Joins D2S as Vice President

Press Release • September 10, 2024

Bala Thumma will be responsible for D2S’ GPU-accelerated pixel-level dose correction (PLDC) technology, which enhances pattern fidelity and accuracy for writing all masks including curvilinear.

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Silicon Semiconductor: Why the World is Moving to Curvilinear

News • August 30, 2024

Part 1 of a two part article by Leo Pang of D2S

Semiconductor Engineering: Key Technologies To Extend EUV To 14 Angstroms

News • July 29, 2024

D2S CEO Aki Fjuimura comments on curvilinear masks for advanced EUV as part of this overview of what's needed to extend EUV.

Semiconductor Engineering: European Mask And Lithography Conference 2024 Worth Attending

News • July 23, 2024

D2S/eBeam Initiative’s Asmus Hetzel talks about key trends at EMLC, including curvilinear design, AI in inspection, and multi-beam mask writers