News

Three Ways to Improve Wafer Uniformity

News • April 21, 2025

Presented by Aki Fujimura, D2S at PMJ 2025 [April 18, 2025]

Semiconductor Engineering: Three Ways Curvy ILT Together With PLDC Improves Wafer Uniformity

News • April 15, 2025

D2S CEO Aki Fujimura's second blog in the series explains how improving mask manufacturing is the simplest way to reduce wafer variation.

SPIE AL: Pixel-Level Dose Correction (PLDC): Improving Uniformity and Linearity of Manhattan and Curvilinear Masks in 0 TAT

News • February 25, 2025

Presented by D2S CEO Aki Fujimura at eBeam Initiative luncheon at SPIE AL.

Semiconductor Engineering: Improving Uniformity and Linearity for All Masks

News • January 29, 2025

Pixel-level dose correction improves the quality of masks written by multi-beam. Blog by D2S CEO Aki Fujimura.

Semiconductor Engineering: Luminary Panel Sees Progress In EUV Pellicle Adoption As Critical For EUV

News • November 21, 2024

Factors that impact mask lifetime, the future role of actinic inspection, and minimum mask dimensions for high-NA EUV.

Semiconductor Engineering: Luminary Panel Sees Multi-Beam Mask Writers And Curvilinear Masks Key To 193i And EUV

News • October 24, 2024

Purchases of new photomask equipment are expected to grow over the next three years.