Products & Technologies
About D
2
S
Curvilinear
News
Community
Videos
Join D
2
S
Contact Us
Menu
News
Technologies
GPU Acceleration
Deep Learning
MB-MDP & MPC
Curvilinear
Products
CDP
TrueMask
®
ILT
TrueMask
®
MDP
TrueMask
®
DS
TrueMask
®
DLK
TrueModel
®
TrueMask
®
WPA
About D
2
S
About D
2
S
Timeline of D
2
S Technology Highlights
Technology
GPU Acceleration
Deep Learning
MB-MDP & MPC
Curvilinear
Products
CDP
TrueMask
®
ILT
TrueMask
®
MDP
TrueMask
®
DS
TrueMask
®
DLK
TrueModel
®
TrueMask
®
WPA
About D
2
S
About D
2
S
Timeline of D
2
S Technology Highlights
Information
News
Community
Videos
Join D
2
S
Contact Us
Menu
Page 6
Silicon Semiconductor: eBeam Initiative: A voice for the photomask industry during rapid evolution
News • June 21, 2023
As the group approaches its 15th anniversary, the shift to curvilinear masks tops the agenda. Includes D
2
S, Inc. CEO Aki Fujimura.
Read More
EE News Europe: CEO interview: AI creates step change for lithography. Aki Fujimura, D
2
S
News • June 20, 2023
Read More
Semiconductor Engineering: 193i Lithography Takes Center Stage…Again
News • June 16, 2023
High-NA EUV is still in the works, but more chips/chiplets will be developed using older, less-expensive equipment.
Read More
Semiconductor Digest: D
2
S Receives Milestone Order for 50th GPU-Based Computational Design Platform for Optimizing Semiconductor Manufacturing
News • June 13, 2023
Read More
D
2
S Recevies Milestone Order for 50th GPU-Based Computational Design Platform for Optimizing Semiconductor Manufacturing
Press Release • June 13, 2023
GPU Acceleration Key to Enabling Curvilinear Photomask Features for the Widest Semiconductor Process Windows
Read More
Semiconductor Engineering: Reflections On Photomask Japan 2023: Embracing The Era Of Curvilinear Masks
News • May 18, 2023
The entire mask industry needs to prepare for the new ecosystem surrounding curvilinear data handling and metrology
Read More
Older Posts
Newer Posts
